Presentation Information
[15p-PB2-23]Construction of Semiconductor Education by Practical Microfabrication at Gifu Kosen (II)
〇Hitoe Habuchi1, Tetsuya Fukunaga1, Tamio Iida1, Eiji Shiraki1, Mari Kasashima1 (1.NIT, Gifu Coll.)
Keywords:
semiconductor education,maskless lithography,diffractive optical element
This study reports on practical semiconductor education at Gifu KOSEN under the COMPASS 5.0 (Semiconductor) initiative. Through collaboration with companies, the program aims to deepen students’ understanding of semiconductor processes and the industry. Supported by a JSPS Grant-in-Aid for Scientific Research adopted in FY2025, a maskless lithography (MLL) system was introduced, enabling students to experience semiconductor front-end processes without metal masks. Using MLL-based photolithography, various microfabrication activities have been conducted. These include fabrication of diffractive optical elements and computer-generated hologram devices for diffraction experiments, semiconductor device fabrication such as pn-junction diodes and MOSFETs, and the development of science education tools, including a constellation projection device used in a hands-on workshop at the Osaka–Kansai Expo.