Presentation Information
[15p-PB2-6]Investigation of Quantitative Evaluation of Shear Phenomena in Organic Nano Thin Films(Ⅲ): Introduction of MSD
〇Chihiro Miyashita1, Shima Ishisaki1, Kazuhiro Tada1 (1.NIT, Toyama Coll.)
Keywords:
Molecular dynamics,Nanoimprint,Mean squared displacement
To improve the performance of nanoimprint lithography, it is essential to understand shear phenomena at the nanoscale. In addition, Mean squared displacement (MSD) is widely used as a quantitative measure to evaluate the magnitude of particle and molecular motion. In this study, we have introduced MSD into molecular dynamics analyses of nanoscale shear phenomena, with the aim of quantitatively evaluating the influence of structural geometry during the shear process.