[15p-W9_326-1~15] 7.1 X-ray technologies

5:15 PM - 5:30 PM JST(8:15 AM - 8:30 AM UTC)

[15p-W9_326-14] Quantitative Evaluation of the Relationship Between Surface Roughness and X-ray Diffraction in Silicon Crystals

〇Akio Yoneyama¹, Masahide Kawamoto¹, Chika Kamezawa², Kazuyuki Hyodo³ (1.SAGA-LS, 2.Tohoku Univ., 3.KEK PF)

Keywords:

CT,Silicon,surface roughness

We quantitatively investigated the influence of silicon crystal surface roughness on the quality of X-ray diffraction and synchrotron radiation-based micro-computed tomography (micro-CT) images. Si(111) crystals with various polishing conditions were examined at beamline BL07 of SAGA-LS. Measurements of diffraction intensity and angular width revealed that increased roughness yielded broader diffraction peaks and higher integrated intensities. Additionally, microCT imaging of wood using monochromated X-rays indicated that rougher crystal surfaces lead to decreased spatial resolution and reduced CT values.