[15p-W9_326-1~15] 7.1 X-ray technologies

2:30 PM - 2:45 PM JST(5:30 AM - 5:45 AM UTC)

[15p-W9_326-5] High Reflectivity of Mo/Si Multilayer Mirrors with Nitride Barrier Layers

〇(M1)Yuta Fujisawa¹, Maidul HAQUE¹, Shun UJI¹, Ryohei SHIBATA¹, Mitsunori TOYODA¹ (1.Tokyo Polytechnic Univ.)

Keywords:

reactive sputtering,X-ray Reflectance,Ellipsometry

Mo/Si multilayer mirrors at an operating wavelength of 13 nm are affected by the interfacial diffuse layer that reduces the direct-incidence reflectance. Therefore, we are investigating the introduction of Mo₂N by N₂ reactive sputtering as a barrier layer at each interface between Mo and Si to achieve high reflectivity. In this presentation, as a preliminary study, deposition of Mo₂N films by reactive sputtering and optimization of deposition conditions will be reported. Deposit samples with different N₂ gas flow rates, the decrease in deposition rate and the reduction in interface roughness due to nitridation were read off from the XRR results.