Presentation Information

[15p-W9_326-7]100-pm Accuracy in Wavefront Control of a High Magnification Imaging Objective for EUV Microscopy

〇(P)Shun Uji1, S. Maidul Haque1, Mitsunori Toyoda1 (1.Tokyo Polytechnic Univ.)

Keywords:

Extreme Ultraviolet,Point diffraction interferometer,EUV Microscopy

To develop an EUV microscope capable of diffraction-limited imaging at a wavelength of 13.5 nm, wavefront measurement and correction of a high-magnification objective were performed using a point diffraction interferometer (PDI). The objective mirror, consisting of a Schwarzschild and an additional magnification mirror, was integrated into the PDI, and aberration correction was performed at astigmatism, coma, and spherical aberration. In particular, the coma aberration originating from assembly misalignment and structural distortion was reduced from 5.8 nm rms to 0.07 nm rms, demonstrating high accuracy wavefront control on the order of 100 pm.