Presentation Information

[16a-W9_327-2]Incorporation of Nickel Silicide in Multistage Silicon Micro Thermoelectric Devices

〇(B)Kaichi Takayama1, Takuya Miura1, Mai Awata1, Tatsuya Hayashi1, Kotaro Okuda1, Yusuke Kozuka1,2, Makoto Kashiwagi3, Takayoshi Shimura1, Takanobu Watanabe1 (1.Waseda Univ., 2.NIMS, 3.NTRC)

Keywords:

thermoelectric generation,semiconductor,seebeck effect