[16a-WL2_101-1~10] 6.4 Thin films and New materials

11:00 AM - 11:15 AM JST(2:00 AM - 2:15 AM UTC)English Presentation

[16a-WL2_101-8] Autonomous synthesis workflow for oxide thin films

〇Mikk Lippmaa¹, Hatong Liang², Ichiro Takeuchi² (1.Univ. of Tokyo, 2.Maryland Univ.)

Keywords:

Autnomous synthesis,PLD,RHEED

We have developed an iterative autonomous synthesis workflow for epitaxial oxide thin films, where multiple thin films are synthesized in a sequence while the in-plane lattice parameter and phase composition is monitored in real time by reflection high-energy electron diffraction (RHEED) analysis and the film growth process conditions are selected for each deposition iteration by Bayesian optimization. The autonomous workflow not only finds the optimal process conditions for film growth, but also provides a surrogate model of the variation of the film quality over the whole multidimensional process parameter space. We demonstrate the performance of the autonomous synthesis tool by fabricating high-quality metastable hexagonal TbFeO₃ thin films.