[16a-WL2_301-1~9] 3.7 Optical measurement, instrumentation, and sensor

9:30 AM - 9:45 AM JST(12:30 AM - 12:45 AM UTC)

[16a-WL2_301-1] Surface Metrology for Transparent Films Based on Phase-Shifting Interferometry

〇Toki Moriyama¹, Takeshi Shimano¹, Yukinobu Tanaka¹, Shunichi Matsumoto², Shigeru Serikawa², Maki Tanaka² (1.Hitachi, 2.Hitachi High-Tech)

Keywords:

optical interferometry

The phase-shifting method is a well-established optical technique for fast and highly accurate surface profilometry. However, its direct application to sufaces coated with optically transparent films is inherently challenging. In this study, we propose a measurement method that independently acquires not only the interferometric intensity but also the object-beam intensity, thereby allowing reliable determination of both film thickness and surface topography.