Presentation Information

[16a-WL2_401-2]Deposition Time Dependence of DLC Films Prepared by High-Rate Filtered Arc Deposition

〇Haru Sano1, Genki Sano1, Hirofumi Takikawa1, Takahiro Hattori2, Hiroki Gima2 (1.Toyohashi Univ. Technol., 2.OSG Corp.)

Keywords:

ta-C,hydrogen-free DLC,deposition temperature

DLC coating is widely used to improve the anti-adhesion and wear resistance of cutting tools. Our uniquely developed High-Rate Filtered Arc Deposition (HR-FAD) system tends to increase the substrate temperature due to its characteristics. While previous research confirmed the effectiveness of cooling intervals, this study aimed to optimize productivity. To achieve this, we measured the substrate temperature while the rotating table was fixed and conducted simulations of temperature changes during actual rotation.