Presentation Information
[16p-M_107-8]Selective-area growth of vertical III-V nanowires on Si(111) using metal/insulator composite mask and multi-mode transistor application
〇Keita Taniyama1, Hitoshi Watanabe1, Yuki Takeda1, Yuki Azuma1, Katsuhiro Tomioka1 (1.GS of IST and RCIQE, Hokkaido Univ.)
Keywords:
III-V,nanowire,FET
