Presentation Information
[16p-PB3-3]Fabrication of diamond thin-film structures by combining reactive ion etching for temperature sensing
〇Hiroki Tsuchiya1,2,4, Yuma Itabashi1,2, Ryosei Okaniwa1,2, Hideyuki Watanabe4, Satomi Ishida3, Hidetsugu Matsukiyo3, Masao Nishioka3, Satoshi Iwamoto3, Junko Ishi-Hayase1,2 (1.Keio Univ, 2.Keio CSRN, 3.RCAST U-Tokyo, 4.AIST)
Keywords:
Reactive ion etching,bulk diamond,temperature imaging
To realize high-sensitivity and high-spatial-resolution temperature imaging using nitrogen-vacancy (NV) centers in diamond, this study aims to overcome the degradation in measurement performance caused by the high thermal diffusion of bulk diamond. We fabricated diamond thin-film structures containing NV centers using a process that combines anisotropic reactive ion etching (RIE) and isotropic RIE. The fabricated thin-film structures are expected to be applied to fault detection in electronic circuits.