Presentation Information
[16p-WL2_401-2]Thickness dependence of the transverse Seebeck coefficient in Fe3Si film/Si and its origin
〇Reona Kitaura1, Tsukasa Terada1, Takafumi Ishibe1,2, Nobuyasu Naruse3, Masaki Mizuguchi4, Takanori Kida5, Masayuki Hagiwara5, Yoshiaki Nakamura1,2 (1.Eng. Sci. The Univ. Osaka, 2.OTRI The Univ. Osaka, 3.Shiga University of Medical Science, 4.IMaSS Nagoya Univ., 5.AHMF, Grad. Sch. Sci., Univ. Osaka)
Keywords:
Thermoelectric material,Silicide
