Presentation Information

[17a-M_178-5]Fabrication of CrS2 atomic-layer thin film and high-resolution ARPES study

〇Koki Yamamoto1, Koki Yanagizawa1, Marika Nishigami1, Katsuaki Sugawara1,2,3, Kenichi Ozawa4, Yoshiyuki Otsubo5, Takashi Takahahi1, Takafumi Sato1,2,6,7,8 (1.Dept. Phys., Tohoku Univ., 2.WPI-AIMR, Tohoku Univ., 3.JST-PRESTO, 4.KEK-IMSS-PF, 5.QST, 6.CSIS, Tohoku Univ., 7.SRIS, Tohoku Univ., 8.MathCSS, Tohoku Univ.)

Keywords:

Transition Metal Dichalcogenides,Molecular Beam Epitaxy method,ferromagnetic thin film

Chromium-based transition metal dichalcogenides (TMDs) have attracted significant attention as an excellent candidate of atomically thin ferromagnetic materials with high Curie temperatures. However, the fabrication of Cr-based TMD atomic-layer films depending on the chalcogen atoms and their detailed electronic states have not been reported yet, and their physical properties remain unclear. In this talk, we will demonstrate sample fabrication methods of monolayer CrS2 using MBE and topotactic methods, and report the results of high-resolution ARPES and XMCD experiments.