Presentation Information
[17a-M_178-8]Development of a Dedicated Exfoliation Tape for TMD Crystals
〇(PC)Momoko Onodera1, Mikinori Ando2, Taketo Hashimoto2, Tomoki Machida1 (1.IIS, Univ. of Tokyo, 2.Riken Technos Corp.)
Keywords:
mechanical exfoliation,TMD,adhesive tape
Mechanical exfoliation using adhesive tape remains a simple and widely used method for preparing two-dimensional materials. However, TMD crystals have stronger interlayer interactions than graphene, making high-quality exfoliation difficult with commercial tapes.
We addressed this limitation by designing a new exfoliation tape ("FHB tape") whose adhesive layer has high surface flatness and whose backing film has high bending stiffness. For MoS2 and WS2, the tape enabled reproducible preparation of large-area monolayer and few-layer flakes with lateral sizes of tens to hundreds of micrometers.
Furthermore, the tape was effective for materials that are generally difficult to exfoliate, such as the layered magnetic crystals MnPSe3 and RuCl3. Although monolayers were not obtained, relatively large and flat thin flakes were successfully prepared.
These results demonstrate that material-specific optimization of tape structure enables stable fabrication of high-quality TMD monolayers and few-layer flakes, providing a useful guideline for processing and thin-film engineering of 2D materials.
We addressed this limitation by designing a new exfoliation tape ("FHB tape") whose adhesive layer has high surface flatness and whose backing film has high bending stiffness. For MoS2 and WS2, the tape enabled reproducible preparation of large-area monolayer and few-layer flakes with lateral sizes of tens to hundreds of micrometers.
Furthermore, the tape was effective for materials that are generally difficult to exfoliate, such as the layered magnetic crystals MnPSe3 and RuCl3. Although monolayers were not obtained, relatively large and flat thin flakes were successfully prepared.
These results demonstrate that material-specific optimization of tape structure enables stable fabrication of high-quality TMD monolayers and few-layer flakes, providing a useful guideline for processing and thin-film engineering of 2D materials.