Presentation Information
[17a-PA2-22]Fabrication of Compositionally Gradient GZO Thin Films by Combinatorial Sputtering Using a Single Cathode Powder Target
〇Tamiko Ooshima1, Gaku Yazaki1, Fumiya Shimizu1 (1.Nagasaki Univ.)
Keywords:
combinatorial,sputtering,powder target
We developed a combinatorial deposition technique using single-cathode sputtering with powder targets to fabricate GZO thin films. A single deposition run produced 58 samples from a 4-inch Si wafer, revealing a composition gradient with Ga content ranging from 1.8 to 7.2 at%. Furthermore, both Ga content and resistivity varied depending on the position on the wafer. This variation is attributed to the arrangement of the powder targets, indicating that the composition gradient can be controlled through the design of the target layout.