[17a-PB1-1~32] 6.3 Oxide electronics

[17a-PB1-12] Effects of film thickness and low vacuum annealing on the properties of Cu₂O thin films prepared by reactive RF magnetron sputtering

Ryoma Aoki¹, Ai Moriyama¹, 〇Junji Sawahata¹ (1.NIT (KOSEN), Ibaraki Col.)

Keywords:

Cu2O,thin film,low vacuum annealing