[17a-PB1-1~32] 6.3 Oxide electronics

[17a-PB1-7] Fabrication and Characterization of IGZO Thin-Film Transistors Using High-Power Impulse Magnetron Sputtering

Taketo Nagata¹, Haruya Naganawa², Kosuke Takenaka², Yuichi Setsuhara², 〇Takayuki Ohta¹ (1.Meijo Univ., 2.Osaka Univ.)

Keywords:

sputtering,Oxide semiconductor