[17p-WL2_401-1~14] 3.13 Silicon photonics, Photonics-electronics convergence, Optical control

2:30 PM - 2:45 PM JST(5:30 AM - 5:45 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[17p-WL2_401-5] 6-inch Wafer-scale fabrication of silicon passive components using UV nanoimprint lithography

〇(B)Yuki Nakayama¹, Shu Nagamatsu¹, Gai Ichisawa¹, Towa Maekawa¹, Risako Mori², Yasushi Fujii², Takahiro Asai², Dai Shiota², Kazuto Oonou³, Daiji Tanabe³, Nobuhiko Nishiyama¹, Tomohiro Amemiya¹ (1.Science Tokyo, 2.TOKYO OHKA KOGYO, 3.Tekscend Photomask)

Keywords:

silicon photonics,nanoinprint,UV-NIL

We demonstrated a 6-inch wafer-scale fabrication process for silicon photonic devices using UV nanoimprinting to facilitate widespread adoption. The waveguides, fabricated via full-wafer imprinting, exhibited uniform propagation losses of 1.62 to 1.81 dB/cm across the wafer. These results confirm excellent optical properties comparable to those achieved by electron beam lithography, demonstrating the viability of this technology as a low-cost, large-diameter process.