[18a-M_107-1~6] 8.3 Plasma nanotechnology

9:00 AM - 9:15 AM JST(12:00 AM - 12:15 AM UTC)

[18a-M_107-1] Mass spectrometry of ammonia borane contained He/Ar plasma for h-BN film formation

〇Takeshi Kitajima¹, Shunsuke Matsui¹, Toshiki Nakano¹ (1.Nat. Def. Acad.)

Keywords:

plasma,2D materials,dielectric films

In order to rapidly synthesize h-BN, an insulating material suitable for layering in the field of two-dimensional electronics, a large supply of activated species from ammonia borane precursor by plasma is required. In this study, plasma irradiation was performed using the ratio of He/Ar mixed gas as a parameter, and it was confirmed that the supply of BNH₅ radicals reached its maximum at an He ratio of 80%. The results reflect the state transition, and bubble generation is inferred from He ion bombardment of the surface polymerized film of ammonia borane powder.