Presentation Information
[18a-PB3-5]Development of an Automated Etching System for Wavefront Correction of EUV Microscope Mirrors
〇(B)Yuichiro Deguchi1, Ryohei Sibata1, Reku Ogata1, Yumie Nakagome1, Mitunori Toyoda1 (1.Tokyo Polytechnic Univ.)
Keywords:
Multilayer mirror,Schwarzschild optics,Reflective wavefront control
An automated etching system was developed to achieve reflective wavefront control with 10-pm precision by regulating the surface layer of EUV multilayer mirrors at the nanometer scale. The apparatus consists of cleaning tanks, a drying unit, an ellipsometer, and a "Nova5" collaborative robot. By implementing an integrated control system using Lua and UWSC, the study successfully reduced processing time—a challenge in manual operations—and significantly enhanced the reproducibility of measurement data. These results demonstrate the system's potential for application in optical systems for EUV microscopy.