[18a-S4_201-1~6] 3.6 Laser processing

11:15 AM - 11:30 AM JST(2:15 AM - 2:30 AM UTC)

[18a-S4_201-4] Formation of Hydrophobic Silicone Nanofilms Using ArF Excimer Laser (2)

〇(D)Yoshimi Shibuta¹, Masayuki Okoshi¹ (1.NDA)

Keywords:

ArF excimer laser,Silicone nanofilm,Hydrophobic property

In the previous study, a synthetic quartz glass substrate and silicone rubber were placed 1 mm apart, and an ArF laser was irradiated from the substrate side at a low fluence onto the rubber surface in air. As a result, it was shown that low-molecular-weight silicone generated by photocleavage of the silicone's main chain structure formed as a nanofilm on the substrate. In this study, an ArF laser was incident from the silicone side, generating low-molecular-weight silicone by photocleavage on the backside of the rubber, and it was shown that a nanofilm formed on the substrate placed in the direction of laser irradiation.