[18a-WL1_201-1~8] 6.4 Thin films and New materials

11:15 AM - 11:30 AM JST(2:15 AM - 2:30 AM UTC)

[18a-WL1_201-7] Influence of surface energy on thin film growth revisited

Zainab Fatima¹, 〇Isao Ohkubo^1,2, Satoshi Ishii^1,2, Takahiro Nagata¹, Takashi Aizawa¹, Takao Mori^1,2 (1.NIMS, 2.Univ. of Tsukuba)

Keywords:

surface energy,epitaxial growth,Cu3N

The importance of surface energy in controlling crystal orientation during thin film growth was revisited on Cu₃N thin film growth using DC magnetron sputtering. The influence of surface energy has often been overlooked in thin film growth. By controlling the thermodynamics and kinetics during thin film growth, we overcame the tendency for both low-surface-energy (100) orientation and high-surface-energy (111) orientation to form readily, successfully fabricating single (111)-oriented epitaxial Cu₃N thin films with higher surface energy.