Presentation Information
[18a-WL2_401-5]Ultra-Low Crosstalk 1×2 Silicon MZI Switch Enabled by Ge2Sb2Te3S2 Intensity Modulator
〇(M2)Kenji Kobayashi1, Yuto Miyatake1, Rui Tang1, Kotaro Makino2, Shogo Hatayama2, Makoto Okano2, Kasidit Toprasertpong1, Shinichi Takagi1, Mitsuru Takenaka1 (1.The Univ. of Tokyo, 2.AIST)
Keywords:
Silicon Photonics,Optical Switch,Phase Change Material
In this study, we propose a termination-absorptive 1×2 MZI optical switch using a wide-bandgap phase-change material, Ge2Sb2Te3S2 (GSTS), as an optical intensity modulator. In the proposed scheme, GSTS is integrated at the output waveguide termination of the MZI, and the GSTS at the off port is crystallized to absorb leakage light at the termination. This enables a significant reduction in crosstalk compared with conventional approaches, making the proposed device a suitable building block for large-scale silicon photonic optical switches.
