[18p-S4_201-1~11] 3.6 Laser processing

3:15 PM - 3:30 PM JST(6:15 AM - 6:30 AM UTC)

[18p-S4_201-6] Depth temperature control in KrF excimer laser annealing

〇Keita Katayama^1,2, Liu Yifan¹, Uetsuki Shinnosuke¹, Yabuta Hisato^1,2 (1.ISEE, Kyushu Univ., 2.GigaphotonNextGLP, Kyushu Univ.)

Keywords:

laser annealing,laser doping,KrF excimer laser

Laser annealing using a KrF excimer laser is characterized by localized surface heating. Employing a high repetition rate allows subsequent pulses to be applied while residual heat history remains, resulting in longer effective heating times compared to simpler laser irradiation. Furthermore, we describe techniques for selectively heating the surface through thermal diffusion and pulse control.