Presentation Information

[18p-WL2_201-3]Highly Integrated Perovskite Nano-Light Source Array Drawn by a Focused Electron Beam

〇(M1)Yoshihiro Miki1, Midori Ikeuchi2, Hidehiro Yamashita2, Hikaru Saito2 (1.IGSES, Kyushu Univ., 2.IMCE, Kyushu Univ.)

Keywords:

perovskite,nano-light source,electron beam irradiation

In the generation of CsPbBr3 nano-light sources by focused electron beam irradiation of Cs4PbBr6 films, conventional methods resulted in structural changes extending several hundred nanometers into the surrounding area. To suppress the expansion of damaged regions caused by heating or secondary electrons, Cs4PbBr6 films were formed on an Al layer. As a result, the formation of a nano-light source array with 150 nm spacing was clearly confirmed. This technique effectively localizes electron beam-induced changes and serves as an effective approach for achieving highly integrated perovskite nano-light sources.