The 9th International Congress on Laser Advanced Materials Processing (LAMP2025)
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Session Details

LPM Oral PresentationLPM : LPM 5

LPM 5: Fundamentals of Laser-materials Interactions

Tue. Jun 10, 2025 3:20 PM - 5:30 PM JST
Tue. Jun 10, 2025 6:20 AM - 8:30 AM UTC
Room 2(4F)
3:20 PM - 3:50 PM JST(6:20 AM - 6:50 AM UTC)Invited Talk

[6-01]Laser nanoprocessing utilizing a tightly focused radially polarized beam

*Yuichi Kozawa1 (1. Institute of Multidisciplinary Research for Advanced Materials, Tohoku University (Japan))
3:50 PM - 4:10 PM JST(6:50 AM - 7:10 AM UTC)Student presentation

[6-02]The Effect of Laser Polarisation State in Ultra-Short Pulsed Laser Processing of Birefringent Materials

*Ross A. Herbert1, Adrian Dzipalski1, M.J. Daniel Esser1, Duncan P. Hand1, Richard M. Carter1 (1. Heriot-Watt University (UK))
4:10 PM - 4:30 PM JST(7:10 AM - 7:30 AM UTC)Student presentation

[6-03]Single-shot measurement of electron temperature under femtosecond laser irradiation

*Tomohiro Fukui1, Qinru Zheng1, Seitaro Kumo1, Nobuhiro Kaku1, Yuta Teshima1, Junya Hattori1, Yanming Zhang1, Yusuke Ito1 (1. The University of Tokyo (Japan))
4:30 PM - 4:50 PM JST(7:30 AM - 7:50 AM UTC)Student presentation

[6-04]Evaluation of surface elastic wave on anthracene crystal by femtosecond laser and atomic force microscope

*Yuhau Ye1, Yuka Tsuri1,2, Yoichiroh Hosokawa1,2 (1. Division of Materials Science, Nara Institute of Science and Technology (Japan), 2. Medilux Research Center, Nara Institute of Science and Technology (Japan))
4:50 PM - 5:10 PM JST(7:50 AM - 8:10 AM UTC)

[6-05]Thermal accumulation in ultrafast laser materials processing

Xiao Jia1, Shubha Majumder1, *Xin Zhao1 (1. Clemson University (United States of America))
5:10 PM - 5:30 PM JST(8:10 AM - 8:30 AM UTC)

[6-06]Pulse-to-pulse characterization of ultrafast charge emission and ablation depth profiles in femtosecond laser ablation process

Ryo Tamaki1,2, Koki Kumagai1, Ryoya Gotoh1, Gaku Asai3, Yuichi Takigawa3, *Ikufumi Katayama1 (1. Yokohama National University (Japan), 2. Kanagawa Institute of Industrial Science and Technology (Japan), 3. Nikon Corporation (Japan))
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