The 46th Annual Meeting of the Laser Society of Japan
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Session Details

C: High-intensity and high-energy laser applicationsOral Presentation

[C01-13a-IV]Award lecture, EUV light source, Attosecond science

Tue. Jan 13, 2026 9:30 AM - 10:30 AM JST
Tue. Jan 13, 2026 12:30 AM - 1:30 AM UTC
Room IV(B2 Meeting Room)
Chair:Yuji Fukuda
9:30 AM - 9:45 AM JST(12:30 AM - 12:45 AM UTC)

[C01-13a-IV-01]【産業賞受賞記念講演】マスクパターン検査装置用高輝度EUV光源へのレーザーの応用

*Naosuke Tani1, Keitaro Hayashida1, Karl Joel Hallbaeck1, Masaki Koichi1, Hiroki Miyai1 (1. Lasertec Corporation)
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9:45 AM - 10:00 AM JST(12:45 AM - 1:00 AM UTC)

[C01-13a-IV-02]中赤外レーザー駆動極端紫外光源の最適化に向けた光源パラメータの検討

*Nozomi Tanaka1, Yu Yamamoto1, Katsunobu Nishihara1,2, Atsushi Sunahara3,1, Tomoyuki Johzaki4,1, Akira Sasaki1,5, Shinsuke Fujioka1,6, Masashi Yoshimura1 (1. The University of Osaka, 2. Osaka Metropolitan University, 3. Purdue University, 4. Hiroshima University, 5. QST, 6. NIFS)
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10:00 AM - 10:15 AM JST(1:00 AM - 1:15 AM UTC)

[C01-13a-IV-03]【論文発表賞応募演題】Vacuum ultraviolet cleaning mode for mitigating tin contamination in extreme ultraviolet lithography sources

*ZIJUN ZHONG1, Nozomi Tanaka1, James Edward Hernandez1, Yulin Gong1, Katsunobu Nishihara1,2, Atsushi Sunahara3,1, Tomoyuki Johzaki4,1, Kyung Sik Kang5, Shinji Ueyama6, Shinsuke Fujioka1,7 (1. Institute of Laser Engineering, The University of Osaka, 2. Osaka Metropolitan University, 3. Purdue University, 4. Hiroshima University, 5. Semiconductor R&D Center, Samsung Electronics Co. Ltd., 6. Samsung Device Solutions R&D Japan, Samsung Japan Corporation, 7. National Institute for Fusion Science)
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10:15 AM - 10:30 AM JST(1:15 AM - 1:30 AM UTC)

[C01-13a-IV-04]極限集光による高強度孤立アト秒光子場の生成

*KOTARO IMASAKA1, Natsuki Kanda1, Dianhong Dong1, Bing Xue1, Satoru Egawa2,3, Takuya Hosobata2, Yutaka Yamagata2, Eiji J. Takahashi1 (1. Ultrafast Coherent Soft X-ray Photonics Research Team, RAP, RIKEN, 2. Ultrahigh Precision Optics Technology Team, RAP, RIKEN, 3. Research Center for Advanced Science and Technology, The University of Tokyo)
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