Session Details

[4-3] Thin film fabrication (wurtzite)

Tue. Nov 4, 2025 3:15 PM - 4:30 PM JST
Tue. Nov 4, 2025 6:15 AM - 7:30 AM UTC
Oral session(Aimesse Hall)

[4-3-01]Highly-doped Al0.55Sc0.45N piezoelectric films for applications in MEMS devices: an alternative to replace perovskite-oxide piezoelectric films

*Minh Duc Nguyen1,2, Matthijn Dekkers2, Gertjan Koster1, Guus Rijnders1 (1. MESA+ Institute for Nanotechnology, University of Twente, P.O. Box 217, 7500AE Enschede, The Netherlands , 2. Lam Research International B.V., Auke Vleerstraat 3, 7521PE Enschede, The Netherlands)
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[4-3-02]Piezoelectricity and Ferroelectricity of GaScN Thin Film by Sputtering Method

*Masato UEHARA1,2, Kenji HIRATA1, Yu IKEMOTO2, Yoshiko Nakamura3, Hiroyuki SETOYAMA4, Yudai HAMADA5, Ryoma ASOSHINA2, Hikaru KOBAYASHI2, Sri Ayu Anggraini1, Kazuki OKAMOTO3, Hiroshi YAMADA1,2, Nobuo NAKAJIMA5, Hiroshi Funakubo3, Morito Akiyama1 (1. AIST, 2. Kyushu Univ., 3. Science Tokyo, 4. Saga-LS, 5. Hiroshima Univ.)
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[4-3-03]Understanding the impact of oxygen concentration in Al0.60Sc0.40-targets for reduced costs and environmental-foodprint of mass produced AlScN thin films

*Georg Schönweger1,2, Tom-Niklas Kreutzer2, Simon Fichtner1,2 (1. Institute for Material Science, Kiel University, Kiel, Germany, 2. Fraunhofer Institute for Silicon Technology (ISIT), Itzehoe, Germany)
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[4-3-04]Advances in AlScN Thin Films Deposited by Lam Research Pulsed Laser Deposition Platform

*Matthijn Dekkers1, Renzo Stheins1, Kristiaan Bohm1 (1. Lam Research)
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