Presentation Information
[Tu2-P31-09]Numerical simulation study for analysis of Si nanocrystal / SiOx compound layer by ReaxFF Molecular Dynamics
*Genta Tamura1,2, Naoya Uene2, Kazuhiro Gotoh3,4,5, Noritaka Usami5, Takashi Tokumasu2 (1. Graduate School of Eng., Tohoku University (Japan), 2. Inst. of Fluid Science, Tohoku University (Japan), 3. School of Eng., Niigata University (Japan), 4. IRCNT, Niigata University (Japan), 5. Graduate School of Eng., Nagoya University (Japan))