Presentation Information
[Tu2-P31-12]Suppression of film blistering in silicon nano-crystals/silicon oxide composite layer by insertion of intrinsic hydrogenated amorphous silicon layer
*Kazushi Mizutani1, Kazuhiro Gotoh1,2,3, Tomohisa Tachibana4, Yasuyoshi Kurokawa1,6, Takahiro Ozawa5, Markus Wilde5, Katsuyuki Fukutani5, Noritaka Usami1,6,7 (1. Nagoya University (Japan), 2. Niigata University (Japan), 3. IRCNT, Niigata University (Japan), 4. FREA, AIST (Japan), 5. University of Tokyo (Japan), 6. InFuS, Nagoya University (Japan), 7. IMaSS, Nagoya University (Japan))