(9:00 AM - 12:50 PM JST)[PL]Opening, Award Ceremony and Plenary SessionSession Chair: Meishoku Masahara (Chair, Program Committee), Nobuhiko Nishiyama (Chair, Steering Committee)Opening, Award Ceremony and Plenary SessionsOpenClose
01: Advanced CMOS: Material Science / Process Engineering / Device Technology(2:30 PM - 4:00 PM JST)[A-1]Advanced CMOS: Process TechnologySession Chair: Genji Nakamura (Tokyo Electron Ltd.), Takashi Matsukawa (AIST)Oral PresentationOpenClose
01: Advanced CMOS: Material Science / Process Engineering / Device Technology(4:15 PM - 5:30 PM JST)[A-2]Innovative devices and Sensing technologySession Chair: Hidetoshi Oishi (Sony Semiconductor Solutions Corp.), Shoichi Kabuyanagi (KIOXIA Corp.)Oral PresentationOpenClose
02: Advanced and Emerging Memories / New Applications(2:30 PM - 3:45 PM JST)[B-1]Ferroelectric Memory MaterialsSession Chair: Halid Mulaosmanovic (GlobalFoundries), Atsushi Himeno (Panasonic Holdings Corp.)Oral PresentationOpenClose
02: Advanced and Emerging Memories / New Applications(4:15 PM - 5:30 PM JST)[B-2]In-Memory and Unconventional Computing ISession Chair: Ming-Hsiu Lee (Macronix International Co., Ltd.), Xu Bai (NanoBridge Semiconductor, Inc.)Oral PresentationOpenClose
03: Heterogeneous and 3D Integration / Interconnect / MEMS(2:30 PM - 3:45 PM JST)[C-1]Advanced Metallization ISession Chair: Wei Feng (AIST), Takashi Matsumoto (Tokyo Electron Technology Solutions Ltd.)Oral PresentationOpenClose
03: Heterogeneous and 3D Integration / Interconnect / MEMS(4:15 PM - 4:45 PM JST)[C-2]MEMS and Advanced Metallization ISession Chair: Takeyasu Saito (Osaka Metropolitan Univ.), Christian Dussarrat (Air Liquide)Oral PresentationOpenClose
04: Power / High‐speed Devices and Materials(2:30 PM - 4:00 PM JST)[D-1]Ga2O3 Power DevicesSession Chair: Kohei Sasaki (Novel Crystal Technology, Inc.), Masashi Kato (Nagoya Inst. of Technology)Oral PresentationOpenClose
04: Power / High‐speed Devices and Materials(4:30 PM - 5:30 PM JST)[D-2]Diamond DevicesSession Chair: Norio Tokuda (Kanazawa Univ.), Masashi Kato (Nagoya Inst. of Technology)Oral PresentationOpenClose
05: Photonics: Devices / Integration / Related Technology(4:15 PM - 5:30 PM JST)[E-2]Integrated Light Source and Related TechnologySession Chair: Mizuki Shirao (Mitsubishi Electric), Karim Hassan (CEA-LETI)Oral PresentationOpenClose
06: Energy Harvesting and Converting Devices and Materials(2:30 PM - 3:45 PM JST)[F-1]Thermoelectric materials and devices ISession Chair: Masahiro Nomura (The Univ. of Tokyo), Yoshitaro Nose (Kyoto Univ.)Oral PresentationOpenClose
06: Energy Harvesting and Converting Devices and Materials(4:15 PM - 5:30 PM JST)[F-2]Thermoelectric materials and devices IISession Chair: Shinnya Kato (Nagoya Inst. of Technology), Takuya Hoshii (Tokyo Tech)Oral PresentationOpenClose
08: Low Dimensional Devices and Materials(2:30 PM - 3:30 PM JST)[H-1]Device-ISession Chair: Masafumi Jo (RIKEN), Mahito Yamamoto (Kansai Univ.)Oral PresentationOpenClose
08: Low Dimensional Devices and Materials(4:15 PM - 5:30 PM JST)[H-2]Characterization-ISession Chair: Takuo Sasaki (QST), Yusuke Hoshi (Tokyo City Univ.)Oral PresentationOpenClose
09: Novel Functional / Quantum / Spintronic Devices and Materials(2:30 PM - 3:30 PM JST)[J-1]Qubit ISession Chair: Jun Yoneda (Tokyo Tech), Tomohiro Otsuka (Tohoku University)Oral PresentationOpenClose
09: Novel Functional / Quantum / Spintronic Devices and Materials(4:15 PM - 5:15 PM JST)[J-2]Qubit IISession Chair: Takafumi Fujita (Osaka Univ.), Tokuro Hata (Tokyo Tech)Oral PresentationOpenClose
10: Thin Film Electronics: Oxide / Non‐single Crystalline / Novel Process(2:15 PM - 4:00 PM JST)[K-1]Oxide-TFTs ISession Chair: Mamoru Furuta (Kochi Univ. of Technology), Juan Paolo Bermundo (NAIST)Oral PresentationOpenClose
10: Thin Film Electronics: Oxide / Non‐single Crystalline / Novel Process(4:15 PM - 5:30 PM JST)[K-2]Oxide-TFTs IISession Chair: Jun Koyama (Semiconductor Energy Lab.), Wenchang Yeh (Shimane Univ.)Oral PresentationOpenClose
11: Advanced Materials: Synthesis / Crystal Growth / Characterization(2:30 PM - 4:00 PM JST)[M-1]Oxide MaterialsSession Chair: Takuya Hoshi (NTT Device Technology Lab.), Wen-Wei Wu (NYCU)Oral PresentationOpenClose
11: Advanced Materials: Synthesis / Crystal Growth / Characterization(4:15 PM - 5:30 PM JST)[M-2]Characterization and Device ApplicationsSession Chair: Yoriko Tominaga (Hiroshima Univ.), Shingo Ogawa (Toray Research Center, Inc.)Oral PresentationOpenClose
12: Advanced Circuits / Systems Interacting with Innovative Devices and Materials(2:30 PM - 3:45 PM JST)[N-1]Sensor Circuits and SystemsSession Chair: Keita Yasutomi (Shizuoka Univ.), Wataru Saito (Renesas Electronics Corp.)Oral PresentationOpenClose