Room A (301, 3rd Floor)
Room B (302, 3rd Floor)
Room E (311, 3rd Floor)
Room F (312, 3rd Floor)
Room G (313, 3rd Floor)
Room H (314, 3rd Floor)
Room J (411+412, 4th Floor)
Room K (413, 4th Floor)
Room M (414+415, 4th Floor)
Room N (416+417, 4th Floor)
Poster session hall
JSTUTC
9:00 AMSep 17, 2025 12:00 AM
10:00 AM1:00 AM
11:00 AM2:00 AM
12:00 PM3:00 AM
1:00 PM4:00 AM
2:00 PM5:00 AM
3:00 PM6:00 AM
4:00 PM7:00 AM
5:00 PM8:00 AM
01: Advanced CMOS: Material Science / Process Engineering / Device Technology(9:00 AM - 10:30 AM JST)
[A-3]

Process Technology and Characterization

Session Chair: Genji Nakamura (Tokyo Electron Ltd.), Kasidit Toprasertpong (The Univ. of Tokyo)
Oral Presentation
01: Advanced CMOS: Material Science / Process Engineering / Device Technology(10:45 AM - 12:15 PM JST)
[A-4]

Cryo CMOS and SOI Technology

Session Chair: Anabela Veloso (imec), Satofumi Souma (Kobe Univ.)
Oral Presentation
02: Advanced and Emerging Memories / New Applications(9:00 AM - 10:15 AM JST)
[B-3]

Ferroelectric Devices

Session Chair: Laurent Grenouillet (CEA-Leti), Ming-Hsiu Lee (Macronix International Co., Ltd.)
Oral Presentation
02: Advanced and Emerging Memories / New Applications(10:45 AM - 12:15 PM JST)
[B-4]

Ferroelectric Memory Devices

Session Chair: Halid Mulaosmanovic (GlobalFoundries), Sanghun Jeon (KAIST)
Oral Presentation
02: Advanced and Emerging Memories / New Applications(10:45 AM - 12:15 PM JST)
[E-4]

ReRAM

Session Chair: Wein-Town Sun (eMemory Tech. Inc.), Atsushi Himeno (Panasonic Holdings Corp.)
Oral Presentation
12: Advanced and Innovative Circuits / Systems Interacting with Devices and Materials(9:00 AM - 10:15 AM JST)
[F-3]

Oscillators and Interface Circuits

Session Chair: Akira Tsuchiya (The Univ. of Shiga Prefecture), Takeshi Yoshida (Hiroshima Univ.)
Oral Presentation
12: Advanced and Innovative Circuits / Systems Interacting with Devices and Materials(10:45 AM - 12:00 PM JST)
[F-4]

AI Computing Circuits

Session Chair: Nobuhiko Nakano (Keio Univ.), Yitao Ma (Zhejiang Univ.)
Oral Presentation
07: Organic / Molecular / Bio‐electronics(1:30 PM - 1:56 PM JST)
[SO-PS-07]

07: Organic / Molecular / Bio‐electronics

Session Chair: Kazuhiro Takahashi (Toyohashi Univ. of Technology), Hisashi Kino (Kyushu Univ.)
Short Oral Presentation
05: Photonics: Devices / Integration / Related Technology(9:00 AM - 10:15 AM JST)
[G-3]

Advanced Photonic Designs

Session Chair: Kento Komatsu (Sumitomo Electric Industries, Ltd.), Frederic Boeuf (STMicroelectronics)
Oral Presentation
05: Photonics: Devices / Integration / Related Technology(10:45 AM - 11:45 AM JST)
[G-4]

UV Photonics

Session Chair: Atsushi Ono (Shizuoka Univ.), Kouichi Akahane (NICT)
Oral Presentation
11: Advanced Materials: Synthesis / Crystal Growth / Characterization(9:00 AM - 10:15 AM JST)
[H-3]

Wide Bandgap and Oxide Materials II

Session Chair: Akihiko Kikuchi (Sophia Univ.), Hirokazu Tatsuoka (Shizuoka Univ.)
Oral Presentation
11: Advanced Materials: Synthesis / Crystal Growth / Characterization(10:45 AM - 12:00 PM JST)
[H-4]

Characterization and Device Applications

Session Chair: Shingo Ogawa (Toray Res. Center, Inc.), Wen-Wei Wu (National Yang Ming Chiao Tung Univ.)
Oral Presentation
03: Heterogeneous and 3D Integration / Interconnect / MEMS(9:45 AM - 10:15 AM JST)
[J-3]

3D Integration/Novel Materials

Session Chair: Takeo Minari (NIMS), Masayuki Kitamura (KIOXIA Corp.)
Oral Presentation
03: Heterogeneous and 3D Integration / Interconnect / MEMS(10:45 AM - 12:00 PM JST)
[J-4]

3D Integration/Packaging/Sensors/Novel Materials

Session Chair: Yoshiyuki Oba (Sony Semiconductor Manufacturing Corp.), Wei Feng  (AIST)
Oral Presentation
08: Low Dimensional Devices and Materials(9:00 AM - 10:15 AM JST)
[K-3]

Device I

Session Chair: Mahito Yamamoto (Kansai Univ.), Toshifumi Irisawa (AIST)
Oral Presentation
08: Low Dimensional Devices and Materials(10:45 AM - 12:00 PM JST)
[K-4]

Characterization II

Session Chair: Masafumi Jo (RIKEN), Yusuke Hoshi (Tokyo City Univ.)
Oral Presentation
08: Low Dimensional Devices and Materials(1:30 PM - 2:12 PM JST)
[SO-PS-08]

08: Low Dimensional Devices and Materials

Session Chair: Masafumi Jo (RIKEN), Toshifumi Irisawa (AIST)
Short Oral Presentation
04: Power / High‐speed Devices and Materials(9:00 AM - 10:15 AM JST)
[M-3]

Ga2O3 Power Devices

Session Chair: Kohei Sasaki (Novel Crystal Technology, Inc.), Shinya Takashima (Fuji Electric)
Oral Presentation
04: Power / High‐speed Devices and Materials(10:45 AM - 12:00 PM JST)
[M-4]

GaN, Ga2O3 Processes

Session Chair: Shinya Takashima (Fuji Electric), Kohei Sasaki (Novel Crystal Technology, Inc.)
Oral Presentation
04: Power / High‐speed Devices and Materials(1:30 PM - 2:20 PM JST)
[SO-PS-04]

04: Power / High‐speed Devices and Materials

Session Chair: Taketomo Sato (Hokkaido Univ.), Joel T. Asubar (Univ. of Fukui)
Short Oral Presentation
10: Thin Film Electronics: Oxide / Non‐single Crystalline / Novel Process(9:00 AM - 10:30 AM JST)
[N-3]

Oxide Semiconductor Devices 3

Session Chair: Keisuke Ide (Science Tokyo), Yusaku Magari (Kochi Univ. of Tech.)
Oral Presentation
10: Thin Film Electronics: Oxide / Non‐single Crystalline / Novel Process(10:45 AM - 12:00 PM JST)
[N-4]

Oxide Semiconductor Devices 4

Session Chair: Chih-Yu Chang (TSMC), Chuan Liu (Sun Yat-sen Univ.)
Oral Presentation