01: Advanced CMOS: Material Science / Process Engineering / Device Technology(9:00 AM - 10:30 AM JST)[A-5]CFET Technology and Self-heatingSession Chair: Kuniyuki Kakushima (Science Tokyo), Satofumi Souma (Kobe Univ.)Oral PresentationOpenClose
01: Advanced CMOS: Material Science / Process Engineering / Device Technology(10:45 AM - 12:00 PM JST)[A-6]Integration Technology on Si WaferSession Chair: Shoichi Kabuyanagi (KIOXIA), Shibun Tsuda (Renesas Electronics Corp.)Oral PresentationOpenClose
01: Advanced CMOS: Material Science / Process Engineering / Device Technology(1:30 PM - 2:45 PM JST)[A-7]2D Material IntegrationSession Chair: Keisuke Yamamoto (Kumamoto Univ.), Anabela Veloso (imec)Oral PresentationOpenClose
01: Advanced CMOS: Material Science / Process Engineering / Device Technology(3:15 PM - 4:15 PM JST)[A-8]Vertical FET and New DevicesSession Chair: Hiroyuki Ogawa (Rapidus Corp.), Takashi Matsukawa (AIST)Oral PresentationOpenClose
02: Advanced and Emerging Memories / New Applications(9:00 AM - 10:15 AM JST)[B-5]Ferroelectric FETSession Chair: Toshinori Numata (Toyota Technological Inst.), Halid Mulaosmanovic (GlobalFoundries)Oral PresentationOpenClose
02: Advanced and Emerging Memories / New Applications(10:45 AM - 12:15 PM JST)[B-6]Emerging Memory Devices, and MRAMSession Chair: Keiji Hosotani (KIOXIA Corp.), Yoshihiro Sato (Tohoku Univ.)Oral PresentationOpenClose
02: Advanced and Emerging Memories / New Applications(1:30 PM - 2:45 PM JST)[B-7]Ferroelectric MaterialsSession Chair: Sanghun Jeon (KAIST), Kouichi Nagai (RAMXEED)Oral PresentationOpenClose
02: Advanced and Emerging Memories / New Applications(3:15 PM - 4:30 PM JST)[B-8]Ferroelectric Memory MaterialsSession Chair: Ming-Hsiu Lee (Macronix International Co., Ltd.), Laurent Grenouillet (CEA-Leti)Oral PresentationOpenClose
09: Novel Functional / Quantum / Spintronic Devices and Materials(9:00 AM - 10:30 AM JST)[E-5]Qubit TechnologySession Chair: Jun Yoneda (The Univ. of Tokyo), Hidehiro Asai (AIST)Oral PresentationOpenClose
09: Novel Functional / Quantum / Spintronic Devices and Materials(10:45 AM - 12:00 PM JST)[E-6]Qubit SystemsSession Chair: Toshiyuki Miyazawa (Fujitsu Ltd.), Motoya Shinozaki (Tohoku Univ.)Oral PresentationOpenClose
06: Energy Harvesting and Converting Devices and Materials(1:30 PM - 2:45 PM JST)[E-7]Energy Related MaterialsSession Chair: Yoshitaro Nose (Kyoto Univ.), Shogo Ishizuka (AIST)Oral PresentationOpenClose
07: Organic / Molecular / Bio‐electronics(9:00 AM - 10:15 AM JST)[F-5]Highly Sensitive Devices for Chem/Bio Detection 1Session Chair: Woo-Tae Park (Seoul National Univ. of Science and Technology), Hisashi Kino (Kyushu Univ.)Oral PresentationOpenClose
07: Organic / Molecular / Bio‐electronics(10:45 AM - 12:00 PM JST)[F-6]Highly Sensitive Devices for Chem/Bio Detection 2Session Chair: Cheng-Hsien Liu (National Tsing Hua Univ.), Takashi Tokuda (Science Tokyo)Oral PresentationOpenClose
07: Organic / Molecular / Bio‐electronics(1:30 PM - 2:45 PM JST)[F-7]Bio/Medical ElectronicsSession Chair: Huang-Ming Philip Chen (National Yang Ming Chiao Tung Univ.), Ryugo Tero (Toyohashi Univ. of Technology)Oral PresentationOpenClose
05: Photonics: Devices / Integration / Related Technology(9:00 AM - 10:00 AM JST)[G-5]Photonic ComputingSession Chair: Kouichi Akahane (NICT), Keijiro Suzuki (AIST)Oral PresentationOpenClose
05: Photonics: Devices / Integration / Related Technology(10:45 AM - 11:45 AM JST)[G-6]Materials for PhotodetectorSession Chair: Hideki Ono (OKI), Xuejun Xu (Nippon Telegraph and Telephone Corporation)Oral PresentationOpenClose
11: Advanced Materials: Synthesis / Crystal Growth / Characterization(9:00 AM - 10:15 AM JST)[H-5]Low Dimensional Materials ISession Chair: Yuji Yamamoto (IHP GmbH), Yu-Lun Chueh (National Tsing-Hua Univ.)Oral PresentationOpenClose
11: Advanced Materials: Synthesis / Crystal Growth / Characterization(10:45 AM - 11:45 AM JST)[H-6]Low Dimensional Materials IISession Chair: Shunjiro Fujii (Univ. of Hyogo), Takuya Hoshi (NTT Device Technology Lab.)Oral PresentationOpenClose
11: Advanced Materials: Synthesis / Crystal Growth / Characterization(1:30 PM - 2:45 PM JST)[H-7]Advanced Materials and Thin FilmsSession Chair: Kentaro Watanabe (Shinshu Univ.), Tomohiro Yamaguchi (Kogakuin Univ.)Oral PresentationOpenClose
02: Advanced and Emerging Memories / New Applications(9:00 AM - 10:15 AM JST)[J-5]In-Memory and Unconventional Computing 2Session Chair: Kazuyuki Kouno (Nuvoton Technology Corp. Japan), Yumeng Zheng (Tokyo Univ. of Science)Oral PresentationOpenClose
02: Advanced and Emerging Memories / New Applications(10:45 AM - 12:15 PM JST)[J-6]Emerging Memory Devices, and DRAMSession Chair: Atsushi Himeno (Panasonic Holdings Corp.), Akiyoshi Seko (Micron Memory Japan, K.K.)Oral PresentationOpenClose
08: Low Dimensional Devices and Materials(9:00 AM - 10:15 AM JST)[K-5]Device IISession Chair: Shu Nakaharai (Tokyo Univ. of Tech.), Takamasa Kawanago (AIST)Oral PresentationOpenClose
08: Low Dimensional Devices and Materials(10:45 AM - 11:45 AM JST)[K-6]Characterization IIISession Chair: Shinjiro Hara (NIMS), Takeshi Yanagida (The Univ. of Tokyo)Oral PresentationOpenClose
08: Low Dimensional Devices and Materials(1:30 PM - 2:30 PM JST)[K-7]Device IIISession Chair: Takamasa Kawanago (AIST), Yusuke Hoshi (Tokyo City Univ.)Oral PresentationOpenClose
08: Low Dimensional Devices and Materials(3:15 PM - 4:00 PM JST)[K-8]Device IVSession Chair: Masafumi Jo (RIKEN), Shinjiro Hara (NIMS)Oral PresentationOpenClose
04: Power / High‐speed Devices and Materials(9:00 AM - 10:15 AM JST)[M-5]Emerging Materials and DevicesSession Chair: Joel T. Asubar (Univ. of Fukui), Taketomo Sato (Hokkaido Univ.)Oral PresentationOpenClose
04: Power / High‐speed Devices and Materials(10:45 AM - 12:00 PM JST)[M-6]III-V High-frequency and Power DevicesSession Chair: Takuya Tsutsumi (Osaka Metropolitan Univ.), Yue-ming Hsin (National Central Univ.)Oral PresentationOpenClose
04: Power / High‐speed Devices and Materials(1:30 PM - 2:45 PM JST)[M-7]Technologies for GaN HEMTsSession Chair: Joel T. Asubar (Univ. of Fukui), Taketomo Sato (Hokkaido Univ.)Oral PresentationOpenClose
04: Power / High‐speed Devices and Materials(3:15 PM - 4:30 PM JST)[M-8]Si Materials and DevicesSession Chair: Tsuyoshi Kachi (Toshiba Device & storage), Yue-ming Hsin (National Central Univ.)Oral PresentationOpenClose
10: Thin Film Electronics: Oxide / Non‐single Crystalline / Novel Process(9:00 AM - 10:00 AM JST)[N-5]Ferroelectric Memories and Gate StackSession Chair: Toshiya Murakami (KIOXIA), Hiroyuki Nishinaka (Kyoto Inst. of Technology)Oral PresentationOpenClose
10: Thin Film Electronics: Oxide / Non‐single Crystalline / Novel Process(10:15 AM - 12:15 PM JST)[N-6]Group-IV, III-V based Thin-film Growth, and Device ApplicationSession Chair: Kaoru Toko (Univ. of Tsukuba), Ryo Matsumura (NIMS)Oral PresentationOpenClose