Presentation Information
[B-5-03]Tunneling Dielectric Layer Position Optimization and Performance Trade-offs in FeFETs for Fe-NAND Application
〇Zeqi Chen1,2,3, Xianzhou Shao1,2, Ruoyao Ji1,2, Mingkai Bai1,2,3, Xinpei Jia1,2, Tao Hu1,2,3, Junshuai Chai1,2, Hao Xu1,2, Xiaolei Wang1,2, Wenwu Wang1,2, Tianchun Ye1,2 (1. State Key Lab. of Fabrication Technologies for Integrated Circuits, Chinese Academy of Sciences (CAS), Beijing, China (China), 2. Inst. of Microelectronics of Chinese Academy of Sci. (IMECAS), Beijing, China (China), 3. School of Integrated Circuits, Univ. of Chinese Academy of Sci. , Beijing, China (China))
