Presentation Information
[PS-10-12]Selective Etch-Back Process for Raised Source/Drain SnO2 Thin-Film Transistors
with ITO Source/Drain Electrodes
〇- SangBeom Seo1,2, Dahui - Jeon1,2, In-Hwan - Baek1,2 (1. The Univ. of INHA (Korea), 2. The Univ. of INHA IPCC (Korea))