Presentation Information

[SO-PS-01-02 (Late News)]Fabrication and evaluation of Metal/n+-Ge Contacts with Extremely Low Contact Resistivity

〇Yajun Feng1, Chia-Yuan Kao1, Chao-Ching Cheng2, Iuliana Radu2, Guang-Li Luo3, Keisuke Yamamoto4,5, Dong Wang1,5 (1. IGSES, Kyushu Univ. (Japan), 2. Corp. Res., TSMC (Taiwan), 3. TSRI, NIAR (Taiwan), 4. REISI, Kumamoto Univ. (Japan), 5. FES, Kyushu Univ. (Japan))