Presentation Information
[SO-PS-11-01]Crystallinity-Dependent Selective Etching of SiGe for Next-Generation Transistors
〇Tomoki Tokunaga1,2, Shuma Akiyoshi1,2, Takashi Kajiwara1,2, Koji Usuda3, Toshifumi Irisawa2,4, Atsushi Ogura3, Taizoh Sadoh1,2 (1. Kyushu Univ. (Japan), 2. LSTC (Japan), 3. Meiji Univ. (Japan), 4. AIST (Japan))
