講演情報

[18a-A35-4]Fabrication and Characterization of Germanium Monosulfide Field-Effect Transistors

〇Qinqiang Zhang1, Ryo Matsumura1, Kazuhito Tsukagoshi1, Naoki Fukata1 (1.MANA-NIMS)
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GeS

The discovery of graphene stimulates the development of low dimensional materials based functional devices. However, the gapless behaviors of graphene restrain itself for next-generation semiconducting electronics and optoelectronics. The germanium monosulfide (GeS), as one of the newly re-discovered and promising two-dimensional layered semiconductors, has recently emerged. Previously, we have achieved the synthesis of large area germanium monosulfide (GeS). In this abstract, we focus on the fabrication of the GeS field-effect transistors and its current-voltage characterizations.

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