講演情報
[15p-PB1-20]二段階加熱法で成長したL10-FePdエピタキシャル膜の走査透過型電子顕微鏡観察
Samuel Vergara1,2、Hanuma Kumar Dara3、Amit Kohn3、〇永沼 博4 (1.ENS Paris、2.Lab. Albert Fert、3.Tel Aviv Univ.、4.名古屋大)
キーワード：
L10-FePd、走査透過型電子顕微鏡、二段階焼成法
A STEM study was conducted on 5-nm-thick L10-FePd epitaxial films grown on SrTiO3 (001) substrates using a two-step heating method. Although all films were annealed at 600°C, a small 50 K difference in the first-step heating temperature caused a drastic change in film morphology. Films grown at 150°C form a continuous, uniform layer with an atomically flat surface, as confirmed by cross-sectional HAADF-STEM images showing constant thickness and coherent epitaxial growth. In contrast, films grown at 200°C exhibit pronounced solid-state dewetting, resulting in square-shaped holes penetrating to the substrate and large local thickness variations. These results demonstrate that a subtle change in the first-step heating temperature critically determines the continuity of ultrathin L10-FePd films, emphasizing the importance of early-stage thermal conditions for spintronic applications.