講演情報
[18a-S2_201-9]The annealing temperature dependence of structural and magnetic properties of NiCo2O4/MgAl2O4/Si
〇(M1)Shiho Sugiyama1, Masaaki Tanaka1,2,3, Ryosho Nakane1,3,4 (1.Tokyo Univ., 2.CSRN, Tokyo Univ., 3.NanoQuine, 4.d.;ab)
キーワード：
magnetix oxide、hetero structure
We fabricated NiCo2O4 (NCO), a spinel-type ferrimagnetic oxide predicted to exhibit half-metallicity, on Si substrates toward spin-transport device applications. The crystallographic structure and magnetization of a NCO film are known to be highly sensitive to oxygen pressure and temperature during growth. We demonstrate, for the first time, enhanced magnetization in NCO films grown on Si by controlling the post-growth annealing temperature in an oxygen atmosphere. The annealing-temperature dependence of the magnetic and crystallographic properties were investigated with SQUID magnetometer and XRD, respectively. Under the optimized condition, the NCO film has moderate ferrimagnetism with a saturation magnetization of 1.5 uB/f.u. XRD analysis indicates that annealing at optimal temperature promotes relaxation of lattice strain, without inducing decomposition of NCO into anti-ferromagnetic and insulating rock-salt phases.