[[G]3401-3pm] 20. Materials Chemistry -Basic and Application-

3:20 PM - 3:40 PM JST(6:20 AM - 6:40 AM UTC)Japanese

[[G]3401-3pm-06] Evaluation of Atomic Oxygen Resistance of Amide-POSS Film

○Kazuki Yukumatsu^1,2, Soichi Yokoyama², Mikito Maruyama², Aki Goto¹, Masahito Tagawa³, Yugo Kimoto¹, Yutaka Ie² (1. Japan Aerospace Exploration Agency, 2. Sanken, Osaka University, 3. Graduate School of Engineering, Kobe University)

Keywords:

POSS,Atomic Oxygen