[[PA]-2am] 02. Theoretical Chemistry, Chemoinformatics, and Computational Chemistry

10:00 AM - 11:30 AM JST(1:00 AM - 2:30 AM UTC)Japanese

[[PA]-2am-03] Prediction of Resin Chemical Resistance Using a Multitask Machine Learning Model for Application in Semiconductor Cleaning Equipment

○Mitsuru Yambe¹, Shogo Kunieda¹, Takeru Nakamura¹, Yosuke Hanawa¹, Hitoshi Kamijima², Toshiaki Shintani², Takuma Mitamura², Yoshihiro Hayashi³, Ryo Yoshida³ (1. SCREEN Holdings Co., Ltd., 2. Research Institute of Systems Planning. Inc., 3. The Institute of Statistical Mathematics)

Keywords:

Resin Materials,Organic Solvent,Chemical Resistance,Machine Learning