Session Details
[Tu-P]Extended Defects
Tue. Sep 29, 2026 4:00 PM - 6:00 PM JST
Tue. Sep 29, 2026 7:00 AM - 9:00 AM UTC
Tue. Sep 29, 2026 7:00 AM - 9:00 AM UTC
Poster-A(1st Floor)
[Tu-P-21]Multiphoton-excited photoluminescence analysis of micropipes and related defect structures in 4H-SiC substrates
*Hirofumi Hoshida1, Shota Fujiki1, Mari Yamamoto1, Takeshi Mitani2, Junji Senzaki2 (1. Lasertec Corp. (Japan), 2. National Inst. of Advanced Indus. Sci. and Tech. (Japan))
[Tu-P-22]Physical Revelation and Analysis of Dislocation Densities in Sub-Micron SmartSiC™ Substrates and Direct Correlation with Donor Bulk Crystals
*Alexis DROUIN1, Vanessa OROZCO1, Walter Schwarzenbach1 (1. SOITEC S.A. (France))
[Tu-P-23]Impact of Buffer Thickness on Bipolar Degradation in SiC Power MOSFETs and Diodes under Transient Surge Current Pulses
*Alexander Brunko1, Tobias Erlbacher1, Firas Faisal1 (1. Nexperia Germany (Germany))
[Tu-P-24]Photoluminescence characterization of Shockley Stacking Faults triggered in high power 4H-SiC devices
*Nicolo Piluso1, Cristiano Calabretta1, Fabiana Vento1, Salvatore Adamo1, Ketty Bottari1, Beatrice Carbone1, Giovanni Maira1, Enzo Fontana1, Angela TERRACINA1, Laura ANOLDO1, Giuseppe TOSTO1, Santina BEVILACQUA1, Marco IACOBUCCI1, Santi ALESSANDRINO1, Giuseppe Arena1, Andrea Severino1 (1. Indus. - STmicroelectronics (Italy))
[Tu-P-25]Conversion of Substrate Dislocations to Stacking Faults
and Influence of Aluminum Implantation on Stacking Faults
*Nadja Kölbel1, Birgit Kallinger2, Christian Kallinger Kranert2, Tobias Erlbacher3, Firas Faisal3, Jörg Schulze1,2 (1. Friedrich-Alexander-Universität Erlangen-Nürnberg (Germany), 2. Fraunhofer IISB (Germany), 3. Nexperia (Germany))
[Tu-P-26]Influence of annealing temperature and orientation of basal plane dislocations on their conversion to threading edge dislocations in a 4H-SiC substrate
*Aoi Okada1, Chiharu Ota1, Ryoichi Ohara2 (1. Toshiba Corp. (Japan), 2. Toshiba Electronic Devices & Storage Corp. (Japan))
[Tu-P-27]Carrier-induced reduction in basal-plane slip barriers in 4H-SiC
*Hiroki Sakakima1, Satoshi Izumi1 (1. Univ. of Tokyo (Japan))
