Sponsored by The Japan Society of Applied Physics
Co-sponsored by JSAP Thin Film and Surface Physics Division
Endorsed by The Japan Society of Applied Physics, Silicon Technology Division/IEEE Electron Device Society Japan Chapter/IEICE Electronics Society
SCOPE:
The 2025 International Workshop on “Dielectric Thin Films for Future Electron Devices: Science and Technology” (IWDTF2025) will be held at the Sendai City War Reconstruction Memorial Hall in Sendai, Japan, from November 5th to 7th, 2025. The IWDTF started in 1999, based on a domestic annual workshop on ultrathin silicon dioxide films. The IWDTF2025 is the twelfth workshop, which will focus on the science and technologies of dielectric films for electron devices, such as ultrathin dielectrics, high-k dielectrics, and ferroelectrics. In addition to the papers on materials and processes of dielectrics for conventional logic devices, the papers for various electron devices including memory, power, analog, sensor, and display devices are welcomed. The IWDTF will provide a great opportunity for information exchange and discussion at the forefront of the research on future electron devices. The papers on both experimental and theoretical studies, for a deep understanding of the properties of dielectric films and their interfaces, are welcomed. The workshop will consist of invited and contributed talks. Selected topics of current interests will be reviewed by several invited talks.
Papers are solicited in, but not limited to, the following area:
- Electron device application of dielectric thin films
- Material design of dielectric thin films
- Growth and related process of dielectric thin films
- Characterization and control of dielectrics, dielectrics surfaces, and dielectrics interfaces
- Electrical characterization of dielectrics, dielectrics surfaces, and dielectrics interfaces
- Surface preparation and cleaning issues for dielectrics
- Dielectric wear out and reliability
- Dielectric reliability related to process integration
- Surface passivation technology
- Theoretical approaches to dielectrics, dielectrics surfaces, and dielectrics interfaces
IMPORTANT DATES:
Abstract deadline: August 22, 2025 September 1, 2025
Notification of acceptance: By September 30, 2025
Workshop: November 5-7, 2025
Full paper (JJAP) deadline: December 18, 2025 (tentative)
Important announcement
Wild Bear Sightings and Safety Precautions in Sendai
Due to a severe shortage of forest nuts this year, there have been numerous reports of wild bears venturing into human-inhabited areas in search of food, across the northern half of Japan. In Sendai City, the host of IWDTF2025, there have been sightings of wild bears, but no injuries caused by them have been reported, and people are continuing their daily lives as usual. However, in the mountainous areas of Miyagi Prefecture, four incidents involving human injuries have already been reported this year.
Known as the “City of Trees,” Sendai is rich in nature, with the Hirose River flowing through its center. Walks along the river and in forested areas are especially appealing. However, to avoid unexpected incidents, it is important to stay away from these areas—particularly from evening through early morning. By observing this precaution, you can enjoy a safe stay.
If you must approach such areas, please avoid walking alone. Additionally, although it is a rare occurrence, if you spot a wild bear from a distance, do not attempt to take photos or videos. Leave the area immediately. Wild bears can run 100 meters in just nine seconds.
Below is an excerpt from the official Sendai City website. Please refer to this information and take appropriate precautions to ensure a safe and enjoyable stay.To avoid wild-bear-related incidents (excerpt from the Sendai City website (Japanese only))
Nov 4, 2025 2:21 PM JST
Please note that the oral session room (5F-Meeting Room) on the second (11/6) and third (11/7) days will open from 8:30 am.
Nov 4, 2025 2:09 PM JST
Onlile Program is now available!
Oct 1, 2025 12:21 AM JST
Announcements
- There is currently no announcement.