IWDTF2025

JSTUTC

9:00 AMNov 6, 2025 12:00 AM

10:00 AM1:00 AM

11:00 AM2:00 AM

12:00 PM3:00 AM

1:00 PM4:00 AM

2:00 PM5:00 AM

3:00 PM6:00 AM

4:00 PM7:00 AM

5:00 PM8:00 AM

6:00 PM9:00 AM

5F-Meeting Room

Exhibition Hall (BF1)

Focus Session(9:00 AM - 10:20 AM JST)

[FA]

Focus Session A ~ Functional Thin Films for AI applications

Chair:Shinji Migita(National Institute of Advanced Industrial Science and Technology (AIST)), Kuniyuki Kakushima(Institute of Science Tokyo)

Functional Thin Films for AI applications

Nitride-based Ferroelectrics(10:35 AM - 11:35 AM JST)

[S2]

Chair: Jun Okuno(Sony Semiconductor Solutions), Kasidit Toprasertpong(The University of Tokyo)

Electron device, process, and characterization

Advanced FET Technologies & Optoelectronics(1:00 PM - 3:10 PM JST)

[S3]

Chair:Noriyuki Taoka(Aichi Institute of Techology), Mitsuru Sometani(National Institute of Advanced Industrial Science and Technology (AIST))

Thin film process

Oxide Semiconductors(3:25 PM - 4:55 PM JST)

[S4]

Chair:Noboru Ooike(Tokyo Electron), Tomoyuki Suwa(Tohoku University)

Material design of thin films

Poster Session(5:00 PM - 6:30 PM JST)

[PS]

Electron device, process, and characterization