[19a-A301-1~10] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

9:45 AM - 10:00 AM JST(12:45 AM - 1:00 AM UTC)

[19a-A301-4] Formation of a-SiC thin films using vinylsilane and Tri-methul-aluminum

〇Yuuki Tsuchiizu¹, Kouki Ono², Kennichi Uehara³, Shigeo Yasuhara³, Wakana Takeuchi¹ (1.Aichi Inst. of Tech., 2.Nagoya Univ. Eng., 3.Japan advanced chemicals Ltd.)

Keywords:

SiC,vinylsilane