[19p-A302-1~16] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

4:30 PM - 4:45 PM JST(7:30 AM - 7:45 AM UTC)

[19p-A302-14] Estimation of nitrogen in SnO_x thin film deposited under Ar/N₂ sputtering

〇(M2)Takuma Kawaguchi¹, Tubasa Kobayashi¹, Shinya Aikawa¹ (1.Kogakuin Univ.)

Keywords:

oxide semiconductor,nitrogen doping,nitrogen sputtering