Presentation Information
[19p-P01-55]Establish Au-assisted exfoliation of 2D semiconductor without etching process
〇Daiki Murase1, Keisuke Shinokita1, Yusai Wakafuji2, Momoko Onodera2, Tomoki Machida2, Takashi Taniguchi3, Kenji Watanabe3, Kazunari Matsuda1 (1.Kyoto Univ. IAE, 2.Tokyo Univ. IIS, 3.NIMS)
Keywords:
2D semicondutor,Dry process,Etching-free
The aim of this study is to establish a new fabrication method for two-dimensional semiconductors. This method is completely dry and etching-free process. It can solve the problems of the CVD method, which is expected to be an industrial method, and also the mechanical exfoliation method, which is widely used in fundamental properties of material fields. This research provides a new approach for industrial manufacturing method of two-dimensional semiconductors, and also is expected to contribute to research on the twistronics field of two-dimensional materials, which vary depending on the stacking angles.