Presentation Information

[19p-P01-68]Etching of silicon assisted by MoS2 nanosheets in HF vapor

〇Kaichi Yamamoto1, Toru Utsunomiya1, Takashi Ichii1, Hiroyuki Sugimura1 (1.Kyoto Univ.)

Keywords:

silicon,molybdenum disulfide,assisted chemical etching