Presentation Information
[19p-P01-68]Etching of silicon assisted by MoS2 nanosheets in HF vapor
〇Kaichi Yamamoto1, Toru Utsunomiya1, Takashi Ichii1, Hiroyuki Sugimura1 (1.Kyoto Univ.)
Keywords:
silicon,molybdenum disulfide,assisted chemical etching
silicon,molybdenum disulfide,assisted chemical etching