Presentation Information
[19p-P01-70]Control of Id-Vg hysteresis in SiO2/h-BN/MoS2 n-FET by insertion of h-BN with different thickness
〇Mengnan Ke1, Jiaquan Feng1, Daiki Tsuruoka1, Tianshun Xie1, Nobuyuki Aoki1 (1.Chiba Univ.)
Keywords:
2D materials,Gate stack,FET